Watervliet Arsenal: Where small science has huge impact
June 30, 2009
- Watervliet Arsenal's newest tenant has major sale to the Army Research Laboratory.
- Local, state, and federal political leaders travel to the Arsenal to hear success story.
WATERVLIET ARSENAL, N.Y. (July 1, 2009) - Vistec Lithography, a business tenant on the Watervliet Arsenal, announced Tuesday in a press conference that it will be shipping a new electron beam lithography system to the United States Army for advanced research and development. Representatives from Vistec Lithography Inc. were joined by U.S. Rep. Paul Tonko, New York State Assembly Majority Leader Ron Canestrari, Arsenal Commander Col. Scott N. Fletcher, and Tony Gaetano, president of the Arsenal Business & Technology Partnership.
This advanced EBPG electron beam lithography system was fully constructed at Vistec's facility at the Watervliet Arsenal, the first system fully built at the new state-of-the-art high tech manufacturing facility, where they moved last November.
In November 2008, Canestrari, Sen. Charles E. Schumer, and then-Congressman Mike McNulty along with officials from Vistec, and the Watervliet Arsenal officially announced the grand opening of Vistec's new global headquarters and state-of-the-art manufacturing facility in Watervliet.
The shipment of Vistec's Lithography system to the Army Research Laboratory in Adelphi, MD represents another milestone for the Watervliet Arsenal as it positions itself as a hub for high-tech companies.
Vistec's systems use electrons to write patterns that permit the formation of nanotechnology structures which have dimensions of a few nanometers, with a nanometer being a billionth of a meter (A nanometer is approximately 1/100,000 of the thickness of a sheet of paper). These electron beam lithography systems are used across the world for advanced nanotechnology research, development and manufacturing.
The Army Research Laboratory (ARL) is the US Army's corporate basic and applied research laboratory. ARL has been a user of electron beam lithography and Vistec's systems for advanced military devices and applications. The selection of Vistec for ARL's next generation electron beam system will provide ARL with a state-of-the-art high performance, high throughput patterning capability to sub-10 nanometers for today's and tomorrow's research challenges and prototyping. ARL will utilize the Vistec system in its mission to further scientific discoveries, technology advances and analyses for defense applications.
Rep. Paul Tonko said, "This collaboration between Vistec and the Army Research Laboratory is important because it provides the Army with the tools to conduct cutting edge research that will help enhance our national security. But this shipment is also significant because it represents the continuing growth of the nanotechnology sector in our region. Vistec is here because of the groundwork that has been laid thanks to the bold vision and hard work of many local leaders across all levels of government, academia and private enterprise. This is a partnership that has brought jobs to our region, enhanced the diversity of our economic makeup, and helps keep the Watervliet Arsenal thriving as the nation's cannon maker and as home to a vibrant technology park."
Arsenal Commander, Col. Scott N. Fletcher said, "The Arsenal is committed to working with Vistec Lithography and with our other 30 military and civilian tenant organizations that define today's Arsenal. For nearly 200 years, the Arsenal has been an economic force within the community and we are delighted when one of our business partners achieves success. We all share in that success and therefore, we are very pleased with the Vistec announcement today."
Papken Der Torrossian, CEO of Vistec Lithography Inc., congratulated ARL on the system shipment stating, "Vistec has been one of the leading suppliers of electron beam lithography systems to US military defense contractors and laboratories. Vistec and its employees are very proud to have been selected by ARL for its next generation electron beam lithography system, and to have the opportunity to support the Department of Defense and the United States Government's research activities."
Der Torrossian said that ARL will receive Vistec's newest version of an electron beam system that can make structures as small as 7 nanometers.
"They're (Army) getting a bargain," added Der Torrossian.
Vistec relocated its facilities from Cambridge, England, to Albany and Watervliet, NY, in 2008 based on growth of New York's nanotechnology industry and academic and research expertise at the UAlbany NanoCollege. Vistec is leasing approximately 30,000 square feet of space in the Watervliet Arsenal, where it has transformed a former Arsenal machine shop into a leading-edge high-tech facility with cleanrooms, production space, and modern offices.